電子線照射した高純度ゲルマニウム中の深い欠陥準位

島根大学理学部紀要 Volume 19 Page 83-88 published_at 1985-12-25
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Title
電子線照射した高純度ゲルマニウム中の深い欠陥準位
Title
Deep Defect States in High-Purity Germanium Irradiated with Electrons
Title Transcription
デンシセン ショウシャシタ コウ ジュンド ゲルマニウム チュウ ノ フカイ ケッカン ジュンイ
Creator
Ito Kazuyoshi
Baba Ichiro
Ito Takashi
Source Title
島根大学理学部紀要
Memoirs of the Faculty of Science, Shimane University
Volume 19
Start Page 83
End Page 88
Journal Identifire
ISSN 03879925
Descriptions
Deep defect levels produced in high-purity n-type and p-type germanium by irradiation with 1.O MeV, 1. 5 MeV and 2.0 MeV electrons were studied by DLTS technique. Two electron traps located at E_c -0.36 eV and E_c -0.41 eV found to be formed in n-type material and two hole traps at E_v +0.22 eV and E_v +0.31 eV in p-type. Introduction rates of the traps at E_c -0.41 eV and E_v +0.22 eV depended on irradiation energies of electrons. Capture cross sections of the two electron traps were estimated to be 1.8 x 10^<-11>cm_2 for the level at E_c - 0.36 eV and 8.4 x l0^<-13> cm_2 for the E_c -0.41 eV level, and those of the two hole traps were 1.8 x 10^<-13> cm_2 for the E_v+0.22 eV Ievel and 5.5 x 10^<-14> cm_2 for the E_v+0.31 eV level.
Language
eng
Resource Type departmental bulletin paper
Publisher
島根大学理学部
The Faculty of Science, Shimane University
Date of Issued 1985-12-25
Access Rights open access
Relation
[NCID] AN00108106