| Title |
Nondegenerate Polycrystalline Hydrogen-Doped Indium Oxide (InOx:H) Thin Films Formed by Low-Temperature Solid-Phase Crystallization for Thin Film Transistors
|
| Creator |
Kataoka Taiki
Makino Hisao
|
| Source Title |
Materials
|
| Volume | 15 |
| Issue | 1 |
| Journal Identifire |
EISSN 1996-1944
|
| Language |
eng
|
| Resource Type | journal article |
| Publisher |
MDPI
|
| Date of Issued | 2021-12-7 |
| 権利関係（リンク） |  This work is licensed under a Creative Commons Attribution 4.0 International License. |
| Access Rights | metadata only access |
| Relation |
[DOI] 10.3390/ma15010187
[PMID] 35009333
|
