| ファイル情報(添付) | |
| タイトル |
Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure
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| 著者 |
奥西 亮太
宮地 優悟
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| 収録物名 |
IEEE Transactions on Applied Superconductivity
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| 巻 | 26 |
| 号 | 3 |
| 開始ページ | 7201404 |
| 収録物識別子 |
ISSN 10518223
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| 内容記述 |
その他
This study presents a simple and feasible method for fabricating high-performance REBa_2Cu_3O_y (RE123) films. Nd123 films were established on a single crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425°C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T_c^<onset> of Nd123 film was 67.1 K when fabricated at 525°C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T_c^<onset> of the Nd123 film fabricated at 475°C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.
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| 主題 | |
| 言語 |
英語
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| 資源タイプ | 学術雑誌論文 |
| 出版者 |
IEEE (Institute of Electrical and Electronics Engineers)
|
| 発行日 | 2016-04 |
| 権利情報 |
© 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.
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| 出版タイプ | Accepted Manuscript（出版雑誌の一論文として受付されたもの。内容とレイアウトは出版社の投稿様式に沿ったもの） |
| アクセス権 | オープンアクセス |
| 関連情報 |
[DOI] 10.1109/TASC.2016.2549050
[NCID] AA11946236
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