File | |
Title |
Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure
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Creator |
Okunishi Ryota
Miyachi Yugo
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Source Title |
IEEE Transactions on Applied Superconductivity
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Volume | 26 |
Issue | 3 |
Start Page | 7201404 |
Journal Identifire |
ISSN 10518223
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Descriptions |
This study presents a simple and feasible method for fabricating high-performance REBa_2Cu_3O_y (RE123) films. Nd123 films were established on a single crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425°C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T_c^<onset> of Nd123 film was 67.1 K when fabricated at 525°C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T_c^<onset> of the Nd123 film fabricated at 475°C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.
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Subjects | |
Language |
eng
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Resource Type | journal article |
Publisher |
IEEE (Institute of Electrical and Electronics Engineers)
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Date of Issued | 2016-04 |
Rights |
© 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.
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Publish Type | Accepted Manuscript |
Access Rights | open access |
Relation |
[DOI] 10.1109/TASC.2016.2549050
[NCID] AA11946236
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