Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure

IEEE Transactions on Applied Superconductivity Volume 26 Issue 3 Page 7201404- published_at 2016-04
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Title
Low-Temperature Fabrication of Nd123 Epitaxial Films by KOH Flux Method Under Ambient Pressure
Creator
Okunishi Ryota
Miyachi Yugo
Source Title
IEEE Transactions on Applied Superconductivity
Volume 26
Issue 3
Start Page 7201404
Journal Identifire
ISSN 10518223
Descriptions
This study presents a simple and feasible method for fabricating high-performance REBa_2Cu_3O_y (RE123) films. Nd123 films were established on a single crystalline substrate by the KOH flux method at low temperature and ambient pressure. Above 425°C, the Nd123 in the obtained films demonstrated single-phase and biaxial orientation. The T_c^<onset> of Nd123 film was 67.1 K when fabricated at 525°C but reduced at lower fabrication temperatures, presumably because the Nd became increasingly substituted with Ba. Moreover, the T_c^<onset> of the Nd123 film fabricated at 475°C was enhanced by controlling the Nd/Ba composition ratio in the starting materials.
Subjects
Superconducting film ( Other)
Critical temperature ( Other)
KOH flux method ( Other)
Liquid phase epitaxy ( Other)
NdBa_2Cu_3O_y ( Other)
Language
eng
Resource Type journal article
Publisher
IEEE (Institute of Electrical and Electronics Engineers)
Date of Issued 2016-04
Rights
© 2016 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other users, including reprinting/ republishing this material for advertising or promotional purposes, creating new collective works for resale or redistribution to servers or lists, or reuse of any copyrighted components of this work in other works.
Publish Type Accepted Manuscript
Access Rights open access
Relation
[DOI] 10.1109/TASC.2016.2549050
[NCID] AA11946236