ファイル情報(添付) | |
タイトル |
Highly Ordered Molecular Orientation in a Phthalocyanine Film Deposited on a Well-Polished Indium-Tin Oxide Substrate
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著者 |
Ishihara Hiroaki
Kusagaya Toyotsugu
Tanaka Senku
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収録物名 |
Japanese Journal of Applied Physics
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巻 | 49 |
号 | 8R |
開始ページ | 081602-1 |
終了ページ | 081602-5 |
収録物識別子 |
ISSN 00214922
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内容記述 |
その他
Metal-free phthalocyanine (H_2Pc) was deposited on an indium-tin oxide (ITO) substrate with a pentacene buffer layer, and the effect of polishing of the ITO surface on the molecular orientation of H_2Pc was studied. By rubbing the ITO surface 10,000 times with a plastic eraser, the average surface roughness of ITO was decreased to 1.0 nm from its initial value of 2.0 nm, and the (313^^-) X-ray diffraction peak of α-form H_2Pc became significantly large. Rocking curves and optical absorption spectra indicated that, by polishing the ITO surface, the disorder in the orientation of the stacking axis (b axis) of H_2Pc was reduced. A Schottky barrier cell of H_2Pc with a highly ordered molecular orientation showed a lower photovoltaic performance than that with a disordered orientation.
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言語 |
英語
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資源タイプ | 学術雑誌論文 |
出版者 |
公益社団法人応用物理学会
Japanese Journal of Applied Physics
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発行日 | 2010-08-20 |
権利情報 |
公益社団法人応用物理学会
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出版タイプ | Accepted Manuscript(出版雑誌の一論文として受付されたもの。内容とレイアウトは出版社の投稿様式に沿ったもの) |
アクセス権 | オープンアクセス |
関連情報 |
[DOI] 10.1143/JJAP.49.081602
[NCID] AA12295836
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