Highly Ordered Molecular Orientation in a Phthalocyanine Film Deposited on a Well-Polished Indium-Tin Oxide Substrate

Japanese Journal of Applied Physics Volume 49 Issue 8R Page 081602-1-081602-5 published_at 2010-08-20
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Title
Highly Ordered Molecular Orientation in a Phthalocyanine Film Deposited on a Well-Polished Indium-Tin Oxide Substrate
Creator
Ishihara Hiroaki
Kusagaya Toyotsugu
Tanaka Senku
Source Title
Japanese Journal of Applied Physics
Volume 49
Issue 8R
Start Page 081602-1
End Page 081602-5
Journal Identifire
ISSN 00214922
Descriptions
Metal-free phthalocyanine (H_2Pc) was deposited on an indium-tin oxide (ITO) substrate with a pentacene buffer layer, and the effect of polishing of the ITO surface on the molecular orientation of H_2Pc was studied. By rubbing the ITO surface 10,000 times with a plastic eraser, the average surface roughness of ITO was decreased to 1.0 nm from its initial value of 2.0 nm, and the (313^^-) X-ray diffraction peak of α-form H_2Pc became significantly large. Rocking curves and optical absorption spectra indicated that, by polishing the ITO surface, the disorder in the orientation of the stacking axis (b axis) of H_2Pc was reduced. A Schottky barrier cell of H_2Pc with a highly ordered molecular orientation showed a lower photovoltaic performance than that with a disordered orientation.
Language
eng
Resource Type journal article
Publisher
公益社団法人応用物理学会
Japanese Journal of Applied Physics
Date of Issued 2010-08-20
Rights
公益社団法人応用物理学会
Publish Type Accepted Manuscript
Access Rights open access
Relation
[DOI] 10.1143/JJAP.49.081602
[NCID] AA12295836