| File | |
| Title |
Highly Ordered Molecular Orientation in a Phthalocyanine Film Deposited on a Well-Polished Indium-Tin Oxide Substrate
|
| Creator |
Ishihara Hiroaki
Kusagaya Toyotsugu
Tanaka Senku
|
| Source Title |
Japanese Journal of Applied Physics
|
| Volume | 49 |
| Issue | 8R |
| Start Page | 081602-1 |
| End Page | 081602-5 |
| Journal Identifire |
ISSN 00214922
|
| Descriptions |
Other
Metal-free phthalocyanine (H_2Pc) was deposited on an indium-tin oxide (ITO) substrate with a pentacene buffer layer, and the effect of polishing of the ITO surface on the molecular orientation of H_2Pc was studied. By rubbing the ITO surface 10,000 times with a plastic eraser, the average surface roughness of ITO was decreased to 1.0 nm from its initial value of 2.0 nm, and the (313^^-) X-ray diffraction peak of α-form H_2Pc became significantly large. Rocking curves and optical absorption spectra indicated that, by polishing the ITO surface, the disorder in the orientation of the stacking axis (b axis) of H_2Pc was reduced. A Schottky barrier cell of H_2Pc with a highly ordered molecular orientation showed a lower photovoltaic performance than that with a disordered orientation.
|
| Language |
eng
|
| Resource Type | journal article |
| Publisher |
公益社団法人応用物理学会
Japanese Journal of Applied Physics
|
| Date of Issued | 2010-08-20 |
| Rights |
公益社団法人応用物理学会
|
| Publish Type | Accepted Manuscript |
| Access Rights | open access |
| Relation |
[DOI]
10.1143/JJAP.49.081602
[NCID]
AA12295836
|