Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices

NUCLEAR MATERIALS AND ENERGY Volume 18 Page 67-71 published_at 2019-01
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Title
Influence of heavier impurity deposition on surface morphology development and sputtering behavior explored in multiple linear plasma devices
Creator
Nishijima D.
Kreter A.
Baldwin M. J.
Borodin D.
Eksaeva A.
Hwangbo D.
Kajita S.
Ohno N.
Patino M.
Pospieszczyk A.
Rasinski M.
Schlummer T.
Terra A.
Doerner R. P.
Source Title
NUCLEAR MATERIALS AND ENERGY
Volume 18
Start Page 67
End Page 71
Journal Identifire
EISSN 2352-1791
Subjects
Impurity deposition; Sputtering; Nanostructure ( Other)
Language
eng
Resource Type journal article
Publisher
ELSEVIER SCIENCE BV
Date of Issued 2019-01
Access Rights metadata only access
Relation
[DOI] 10.1016/j.nme.2018.12.008
Remark This work is supported by the US DOE Grant: DE-FG02-07ER54912, and is conducted as part of IEA Technology Collaboration Programme on the Development and Research on Plasma Wall Interaction Facilities for Fusion Reactors.