Defect Passivation and Carrier Reduction Mechanisms in Hydrogen-Doped In-Ga-Zn-O (IGZO:H) Films upon Low-Temperature Annealing for Flexible Device Applications

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language	eng
Attribute	Article
Author	Rostislav Velichko Engineering Course, Kochi University of Technology, Kami, Kochi 782-8502, Japan Magari, Yusaku Furuta , Mamoru Engineering Course, Kochi University of Technology, Kami, Kochi 782-8502, Japan　/　 School of Environmental Science and Engineering, Kochi University of Technology, Kami, Kochi 782-8502, Japan　/　 Center for Nanotechnology, Research Institute, Kochi University of Technology, Kami, Kochi 782-8502, Japan
Journal Title	Materials
Volume	15
Issue	1
ISSN（Online）	1996-1944
Published Date	2022-1-3
DOI	10.3390/ma15010334
Publisher	MDPI
NII Type	Journal Article
rights(link)	This work is licensed under a Creative Commons Attribution 4.0 International License.
OAI-PMH Set	Faculty of Science and Engineering